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Intellemetrics introduces a range of Wafer Vision Systems specially designed for viewing patterned wafers within load-locked vacuum etch and deposition chambers in order to check that the correct wafer has been loaded, and to confirm alignment and placement with respect to the mask pattern.

Image resolution depends upon the working distance and field of view, but typically resolutions of 5µm can be obtained at working distances of 600mm (ideal for ICP etch and deposition chambers) and fields of view of 7mm.

Features include;

  • 5 Mpixel high resolution camera image
  • Co-linear wafer illumination
  • Imaging distance from 100mm to 1000mm
  • Visible feature sizes down to 5um
  • Manual and motorised focusing options

Specification sheet download