The LEP500 Series comes in a number of different configurations to satisfy the etching needs of a wide range of diverse materials as well as the diverse needs of a wide range of applications – from flexible research and development labs to the stringent requirements of high volume production facilities. We have made the range as modular as possible to enable you to choose the system that meets your specific requirements.
| Monitoring Wavelength | 670nm, 980m or 1550nm |
| Working Distance | 200mm to 800mm wafer to LEP500 |
| Camera Image | 5 Mpixel |
| Image Resolution | Working Distance dependant. 4um to 10um |
| Laser Spot Size at Wafer | Working Distance dependant. 8um to 40um at FWHM |
| Collimation | Built-in 2-axis goniometers |
| Alignment | Built-in X-Y Stages Manual or Motorised stages Motorised stages controlled via remote joystick, or via software commands |
| Operation | Either Manual or integrated into etch chamber control system for fully automated operation |
| Coms Interface | Digi IO and/or TCP/IP |
| Controller Module | 2U x 19inch rack mount ruggedised controller module running under Win 10 Pro, with all software and interfaces |
| Software | Full EtchDirector software suite |